Head Office
10th Floor, Ladeco Building, 266 Doi Can, Ngoc Ha Ward, Hanoi
SAFETY-QUALITY-OPTIMIZED COST
Reasons why businesses are costly – behind schedule – facing environmental risks.
Inherent limitations in old plating technology are holding back performance and putting great pressure on manufacturing enterprises.
LEGAL & ENVIRONMENTAL RISKS
Traditional plating processes use toxic cyanide-containing chemicals, which pose significant safety risks to workers and violate environmental standards. This leads to increased costs for wastewater treatment and waste management.
Find out the causeHIGH OPERATING COSTS
Old technology requires many steps and consumes chemicals, causing electricity, water and labor costs to increase significantly. Reducing the competitiveness and profitability of businesses.
LONG PRODUCTION TIME
With a 4–5 step plating process, each production cycle takes 255–385 minutes, causing line congestion and delayed delivery. Directly affecting productivity and business reputation.
DIRECT NIKEL PLATING FLAGSHIP SOLUTION ON ZINC BASE
We are a pioneer in bringing nickel plating technology directly on zinc substrate, eliminating all toxic chemicals and shortening time. Our solution eliminates costly and error-prone steps to optimize performance, save energy and ensure environmental standards.
View Technology Details
GOLDEN BENEFITS
4 CORE VALUES FROM SEMICONDUCTOR NIKEL PLATING TECHNOLOGY
The new generation of metal plating solutions not only optimizes performance but also brings comprehensive efficiency in terms of cost, productivity and environmental safety.
Reduce Costs
Cut operating expenses (OPEX) by up to 30% and capital expenditure (CAPEX) by up to 100% thanks to lean processes and energy savings.
Increased Productivity
Shorten processing time by 5–6 times compared to traditional plating technology – helping businesses increase capacity without expanding the line.
FROM TECHNOLOGY TO SUSTAINABLE SOLUTIONS
TECHNOLOGY BREAKTHROUGH – PIONEERING QUALITY
We accompany businesses on the journey of transforming metal plating technology, helping to optimize performance, save costs and ensure compliance with international environmental standards.
SOLUTION CONSULTATION
STAFF TRAINING
TECHNOLOGY DEPLOYMENT
OPTIMAL COMPANION
TESTING & PERFORMANCE
LONG-TERM COOPERATION
Proud to be a Vietnamese technology company that creates pioneering solutions that change the face of the plating industry in the world. We believe that our contributions will bring competitive advantages to Vietnam’s supporting and mechanical industries in the international arena.
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CUSTOMER FEEDBACK
CUSTOMER SAY ABOUT US
As the head of the company, my primary concerns are legal risks and long-term costs. Eliminating Cyanide is not just about compliance, it’s about protecting our people. Crucially, Dragon V’s ability to cut 30%-60% of our OPEX and require 0% new CAPEX has directly impacted our bottom line. This was a sound strategic decision
LE VAN THIEN
CEO
Before, Nickel plating was our bottleneck; the 4-step process took nearly 5 hours, making it impossible to meet large orders. DENBP/ST-01 changed everything. Cutting the process to 2 steps has increased our barrel plating productivity 5-fold on the same line. The operational process is incredibly simple, drastically reducing errors and pressure on our staff
TRINH THI TAM
Production Manager
Technically, I was very skeptical about direct Nickel plating on Zinc. But the Passivation mechanism of the Semiconductor System is truly innovative. We achieved the highest 5B adhesion score (ASTM D3359) right from the first batch. The DENBP/ST-01 bath is highly stable within the standard pH and temperature ranges, making it easy for our engineers to control and consistently achieve 240 hours of corrosion resistance
PHAM HUNG DUNG
Technical Manager
Connect with Dragon – AAA
CONTACT
ADDRESS
Head Office: 10th Floor, Ladeco Building, 266 Doi Can, Ngoc Ha Ward, Hanoi
Factory: Lot CN8, Nguyen Khe Industrial Cluster, Dong Anh, Hanoi
CALL NOW 24/7
0962.810.931 (Mr. Hien)
0949.335.431 (Mrs. Trang)
EMIAL
dragonvaaa@gmail.com
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